Critical Review of EUV Reticle Inspection Options - (PPT)

摘要

K-T will provide the needed Inspection systems to support EUV development and production requirements. We are collaborating with key EUV industry customers and leading suppliers to define near-term and long-term EUV requirements and solutions For near-term 22 nm Half-Pitch EUV requirements, Enhancements to K-T 6xx reticle inspection platform will enable EUV Blank and Patterned Mask inspection and Reticle Requal. For long-term sub-20 nm EUV requirements, there are several potential technology alternatives, each requiring new techniques and significant development. Investigation of actinic pattern inspection concepts is underway, and should be accelerated via consortium funding.