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Modeling And Analysis Of Lateral Doping Region Translation Variation On Optical Modulator Performance

机译:光调制性能横向掺杂区平移变化的建模与分析

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In this paper, we design and discuss the performance of a silicon phase modulator integrated in a silicon-on-insulator (SOI) waveguide. The modulator employing the p-i-n diode structure will be working at 1.55μm optical telecommunications wavelengths. The lateral translation of doping regions of p~+ and n~+ doping regions are varied, and the refractive index change, phase modulation efficiency and also the absorption loss of the modulator are investigated. Our simulation shows that moving the lateral translation of the doping regions closer to the rib waveguide sidewall, the change of the refractive index increases, resulting better modulation efficiency but experiences more absorption loss.
机译:在本文中,我们设计并讨论集成在绝缘体上的硅相调制器的性能,包括绝缘体中的波导。采用P-I-N二极管结构的调制器将在1.55μm光电信波长下工作。改变P〜+和N〜+掺杂区掺杂区的横向平移,研究了调节剂的折射率变化,相位调制效率和调节剂的吸收损失。我们的仿真表明,将掺杂区域的横向平移移动到肋波导侧壁的较近,折射率的变化增加,导致更好的调制效率,但经历更多吸收损失。

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