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Extreme Nano-structure Control by Sputtering for the High Density Perpendicular Recording Media and Head

机译:通过溅射为高密度垂直记录介质和头部的极端纳米结构控制

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In order to open a way to realize ultra high density hard disk (HD) drives with fast operation speed utilizing a spin nano-technology, precisely controlled fabrication technology with nano-scale for head and media according to the required properties is essential from material, processes, and physical view point. In the present paper, correlation between process parameter of ultra clean (UC) dry-process proposed by us and structure and physical property for ferro/antiferro interface, magnetic tunnel junctions and perpendicular magnetic recording media will be widely discussed.
机译:为了开种利用旋转纳米技术的快速操作速度实现超高密度硬盘(HD)驱动器,利用旋转纳米技术,具有根据所需特性的纳米级具有纳米级的精确控制的制造技术,从材料中必不可少,流程和物理观点。在本文中,广泛讨论了US和结构和结构和物理性质,磁隧道结和垂直磁记录介质所提出的超清洁(UC)干法的处理参数之间的相关性。

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