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Quasi-ballisticity of the electron transport in a 16nm silicon double-gate nMOSFET

机译:16nm硅双栅极NMOSFET中电子传输的准爆发性

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摘要

A deterministic Boltzmann equation solver including the Pauli principle based on a Fourier Harmonic expansion of arbitrary order [1] is used to explorer electron transport in a 16nm double gate nMOSFET. The Boltzmann, Schrödinger and Poisson equations are solved self-consistently. Phonon scattering and surface roughness scattering are considered. Strong ballistic transport is manifested in the shape of the electron distribution functions at different positions along the channel. Directional current and the reflection coefficient are examined at various biases of the on-state.
机译:一种确定性Boltzmann等式求解器,包括基于任意顺序的傅里叶谐波膨胀的Pauli原理[1]用于探索在16nm双栅极NMOSFET中的电子传输。 Boltzmann,Schrödinger和泊松方程是自我解决的。考虑声子散射和表面粗糙度散射。强烈的弹道传输在沿着通道的不同位置处的电子分布函数的形状表现为。在导通状态的各种偏差处检查定向电流和反射系数。

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