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Tunneling-injection High-power 1060-nm Quantum Dot Laser with Improved Temperature Stability

机译:隧道喷射高功率1060-NM量子点激光,具有改善的温度稳定性

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High-power 1060 nm quantum dot laser material was developed with tunnel injection quantum well active zones. This new type of laser material showed an improved internal efficiency (94%) and allowed output power in excess of 4.4 W (limited by the current source) with a high characteristic temperature (197 K) for 100 μm broad area lasers.
机译:高功率1060nm量子点激光材料与隧道喷射量子阱有源区开发。这种新型的激光材料显示出改善的内部效率(94%),并且允许超过4.4W的输出功率超过4.4W(电流源的限制),具有100μm宽面积激光器的高特征温度(197 k)。

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