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Stress relaxation in a nanoinclusion in response to extreme environments

机译:纳米晶算应应对极端环境的应力松弛

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摘要

We consider a stressed nanoinclusion in a crystalline matrix, which is initially coherent, but may relax through local plastic deformation under an impact of heat, mechanical load, irradiation, electric or magnetic fields. The reason for the relaxation process is an increase in the mechanical energy of the inclusion, when the environment conditions are drastically changed. A fingerprint of the proposed stress relaxation scenario is formation of a specific satellite dislocation loop in a close vicinity of the nanoinclusion.
机译:我们考虑晶体基质中的应力纳米型,其最初是相干的,但可以在热量,机械负载,照射,电场或磁场的影响下通过局部塑性变形来放松。弛豫过程的原因是当环境条件发生大幅改变时夹杂物的机械能量增加。所提出的应力弛豫场景的指纹是在纳米晶覆盖附近形成特定的卫星位错环。

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