Adding Physical Scalability to BSIM4 by Meta-Modeling of Fitting Parameters

摘要

A new approach for improving physical scalability of existing compact models is proposed. The behavior of internal BSIM4 model parameters in response to a change in fabrication process condition is modeled by physics-based meta-model equations. By recovering missing links between the fitting parameters and device design parameters, the model parameter sets for variant transistors with different channel implant dose can be predicted starting from a parameter set of existing reference transistors.