Preexposure effect on the fabrication of continuous relief microstructure and advanced method

摘要

The principle and application of the preexposure in the fabrication of the continuous relief microstructure of diffractive optical element with polar coordinate Laser Direct Writing method were described in the paper. The paper also studied the rule of preexposure effect during the fabrication of continuous relief microstructure. We gave a substitute method of preexposure used in fabrication process of the microstructure and fabricated one kind of continuous relief microstructure successfully with the new method in the end.