首页> 外文会议>International Symposium on Photoelectronic Detection and Imaging >Design and research of zoom optic system applied in micro-processing using 248nm KrF excimer laser
【24h】

Design and research of zoom optic system applied in micro-processing using 248nm KrF excimer laser

机译:使用248NM KRF准分子激光器微处理中涂层变焦光学系统的设计与研究

获取原文

摘要

The content of this paper is a design of zoom optic system applied in 248nm KrF excimer laser micro-processing. Due to the characteristic of KrF laser and the applied requests of micro-processing, it was determined that the maximal field of view is 1.2°, the optical material is fused quartz (JGS1) and the value of working distance is greater than 30mm. On the premise that the system has stable image surfaces and good imaging qualities under each different focal length, the goals of design include the continuous zoom ratio Γ=1 ~ 3.5 and the minimal magnification M ≈ 0.1. In addition, the mechanically compensated method was employed to compensate image surface, so as not to change the position of the image plane in the whole range of focal lengths or magnification. The zoom optical system was composed of three parts: the front fixed group, the zoom group and the compensated group. After perfect optical calculation, the correlation of zoom ratio and focal length was obtained. The maximum of focal length is 129.2308mm and minimum is 39.92926mm when M=0.1. For continuous improvement of imaging quality, the initial configuration has been optimized by making use of ZEMAX~R. The result of design can achieve the goal of zoom ratio. During the zoom process, the total length of system is about 290.7065mm with the deviation Δ=±0.0403mm and the minimum of working distance is 59.3094mm. The whole system has good imaging quality and effective etching capability.
机译:本文的内容是应用于248nm KRF准分子激光微处理中的变焦光学系统的设计。由于KRF激光器的特性和微处理的应用请求,确定最大视场是1.2°,光学材料是融合的石英(JGS1),工作距离的值大于30mm。在系统具有稳定的图像表面和每个不同焦距下的成像品质的前提下,设计的目标包括连续变焦比γ= 1〜3.5,最小倍率M≈0.1。另外,采用机械补偿的方法来补偿图像表面,以便在整个焦距或放大率范围内改变图像平面的位置。变焦光学系统由三个部分组成:前固定组,缩放组和补偿组。在完美的光学计算之后,获得了变焦比和焦距的相关性。焦距的最大值​​为129.2308mm,m = 0.1时最小为39.92926mm。为了持续改进成像质量,通过使用Zemax〜R来优化初始配置。设计的结果可以实现缩放比率的目标。在缩放过程中,系统的总长度约为290.7065mm,偏差Δ=±0.0403mm,工作距离最小为59.3094mm。整个系统具有良好的成像质量和有效的蚀刻能力。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号