Design And Construction Of Atomic Force Microscopy System For Nanostructure Patterning

摘要

An Atomic Force Microscopy system for nanostructure patterning through local anodic oxidation is designed and constructed. We introduce here a novel method of patterning using motorized high precision XY stages controlled by software to provide precise pattern movements while the tip remains stationery, as opposed to conventional tip movements. A microscope with solid state camera imaging system is integrated to obtain real time images of the cantilever to 'mark' the precise location of patterns. We have successfully demonstrated the patterning of nanoscale oxide structures on silicon sample using this system.