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The Mathematical Modeling of the MOS-transistors Fabrication Technique in Modern TCAD-systems

机译:现代TCAD系统中MOS晶体管制造技术的数学建模

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Simulation of the MOS-transistors fabrication technique using TCAD (Technology Computer Aided Design) DIOS and TCAD Sentaurus Process the most perspective TCAD-systems from Synopsys company at present was carried out in this work. Special attention was given to research of offered diffusion models and capabilities of the mesh generation algorithm, as these factors have direct influence on final result of modeling and a total time of calculation. In addition, the obtained results were compared with similar calculations of this structure in "FACT" and MicroTec-3.02 software packages.
机译:使用TCAD(技术计算机辅助设计)DIOS和TCAD SENTAURUS处理的MOS晶体管制造技术的仿真最大的透视图 - 目前来自Synopsys公司的透视图 - 在这项工作中进行了。特别注意研究了网格生成算法的提供扩散模型和能力,因为这些因素对建模的最终结果和计算总时间有直接影响。此外,将获得的结果与“事实”和MicroTec-3.02软件包中这种结构的类似计算进行了比较。

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