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Au-Sn co-electroplating solution for flip chip-LED bumps

机译:用于倒装芯片LED凸块的AU-SN共电解解决方案

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摘要

A new non-cyanide and non-toxic stable electroplating solution for co-deposition Au-Sn alloys was investigated in this study. A stable sulfite-based electroplating solution for gold and a stable solution for tin were prepared, respectively. L-ascorbic acid was added into the Au solution and a reducing agent was added into the Sn solution, and then the two solutions were mixed to generate Au-Sn solution. The effects of additives on solution stability at room temperature and high temperatures were studied. Polarization tests of Au, Sn and Au-Sn solutions were carried out to reveal the effect of additives on Au, Sn and Au-Sn plating. Then a series of electroplating tests at different current densities were performed in order to demonstrate plating capability of Au- Sn solutions. It was shown that the species of the main salt for gold affected the stability of solution prominently. EDTA could improve the stability of Au solution at high temperature and the complexing agent for Sn was also benefit to the stability of Sn solution. Two waves in Sn solutions with the complexing agent indicated two cathode reactions occurred during Sn plating. The reducing agent was added to prevent the oxidation of Sn (II), but it turned out to affect the polarization of Sn solutions and the compositions of Au-Sn alloys during co-electroplating. Electroplating experiment results showed that co-electroplating of uniform Au-Sn deposits was feasible.
机译:在本研究中研究了用于共沉积Au-Sn合金的新的非氰化物和无毒稳定的电镀溶液。制备稳定的亚硫酸盐基金和稳定的锡溶液的电镀溶液。将L-抗坏血酸加入到Au溶液中,并将还原剂加入到Sn溶液中,然后将两种溶液混合以产生Au-Sn溶液。研究了添加剂对室温和高温溶液稳定性的影响。进行了Au,Sn和Au-Sn溶液的偏振试验,以揭示添加剂对Au,Sn和Au-Sn电镀的影响。然后进行在不同电流密度下进行一系列电镀测试,以证明Au-Sn溶液的电镀能力。结果表明,黄金的主要盐的物种突出地影响了解决方案的稳定性。 EDTA可以提高高温溶液的稳定性,SN的络合剂也有利于Sn溶液的稳定性。使用络合剂的SN溶液中的两个波在Sn电镀期间表示发生两个阴极反应。加入还原剂以防止Sn(II)的氧化,但结果表明在共电镀期间影响Sn溶液和Au-Sn合金组合物的偏振。电镀实验结果表明,均匀的Au-Sn沉积物的共电镀是可行的。

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