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Solder transfer of lead zirconate titanate (PZT) thin films

机译:铅锆钛酸铅(PZT)薄膜的焊料转移

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摘要

Functional ceramic thin films such as lead zirconate titanate (PZT) are of interest for a wide range of miniaturized devices. However the high processing temperatures of the films make integration of them into such devices challenging. Transfer of these films can allow integration onto substrates that are incompatible with the film deposition processes, but is hampered by the difficulty of detaching the film from the growth substrate. We describe a transfer process for PZT films grown on Ti/Pt coated Si wafers, in which the films are solder bonded onto a target substrate and lifted off in one step, by thermal stress induced separation of the PZT-Pt interface. In order to study effects of the transfer process on the integrated films, polarization-electric field (P-E) hysteresis loop, dielectric constant, and loss tangent measurement were made on both the transferred and as-deposited films. The transferred films show low mechanical damage, ferroelectric hysteresis with an ‘imprinted’ polarization, reduced permittivity, and slightly increased loss tangent at low frequencies (∼ 1 kHz). This transfer technique is potentially a revolutionary approach which could be broadly applicable to a variety of ceramic thin film materials, film growth methods, device geometries, and substrate combinations.
机译:诸如铅锆酯钛酸铅(PZT)的功能性陶瓷薄膜对各种小型化装置感兴趣。然而,薄膜的高处理温度使它们集成到这种器件上具有挑战性的。这些薄膜的转移可以允许整合到与膜沉积过程不相容的基板上,但是由于难以从生长底物中脱离膜而受到阻碍。我们描述了在Ti / Pt涂覆的Si晶片上生长的PZT薄膜的转移过程,其中膜用焊料粘合到目标基质上并通过热应力诱导PZT-PT接口分离在一步中抬起。为了研究转移过程对集成膜的影响,对转移和沉积的薄膜进行偏振电场(P-E)滞圈回路,介电常数和损耗正切测量。转移的薄膜显示出低机械损伤,铁电滞后,具有“印迹”的极化,降低介电常数,低频下的损耗略微增加(〜1 kHz)。该转移技术可能是一种革命性的方法,可以广泛适用于各种陶瓷薄膜材料,薄膜生长方法,装置几何形状和基板组合。

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