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Self-assembly of Functional Groups Inside High Aspect Ratio Silicon Nanopores

机译:高纵横比硅纳米孔内官能团的自组装

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In this study, development of a technique for self-assembly of molecules with functional end groups inside high aspect ratio silicon nanopores is reported, A 20-um thick porous silicon membrane with pore sizes of 5-7 nm was fabricated, The structure was then hydroxylated to enable silane-based self-assembly. A setup was fabricated to hold the membrane die between two chambers charged with dry helium. A 1 mM solution of 3-mercaptopropyl-trimethoxysilane (MPTMS) in benzene was supplied to the top side of the membrane. A constant flow of helium over the bottom of the membrane allowed continuous evaporation of the solvent from the bottom of the pores, so that the fresh solution could get into the pores from top The pores were charged with solvent approximately 10000 times, to supply enough MPTMS molecules to fill the estimated OH sites within the pores Penetration of the MPTMS molecules down to the bottom of the pores was verified by measuring sulfur variation through the membrane thickness using Time of Flight-Secondary Ion Mass Spectroscopy (ToF-SIMS) technique.
机译:在该研究中,报道了高纵横比硅纳米孔内具有功能端基的分子自组装技术的技术,制造了20微米厚的多孔硅膜,制造了5-7nm的孔径,该结构是羟基化以使基于硅烷的自组装。制造成立以将膜模在与干燥氦气充电的两个腔室之间。将1mM的3-巯基丙基三甲氧基硅烷(MPTM)溶液供应到膜的顶侧。膜底部恒定的氦气流动允许从孔的底部连续蒸发溶剂,使得新鲜溶液可以从顶部进入孔隙孔中约10000次加入溶剂,以供电足够的MPTM通过使用飞行二次离子质谱(TOF-SIMS)技术的时间通过膜厚度测量硫变化,通过测量硫变化来巩固孔隙渗透到孔的底部的孔渗透到孔的底部内的估计OH位点。

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