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Activated Reactive Evaporated Nano Crystalline WO3 Thin Films for Electrochromic Windows

机译:用于电致变色窗的活性反应蒸发的纳米晶体WO3薄膜

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Tungsten trioxide thin films were deposited by using home built activated reactive evaporation (ARE) technique on ITO coated substrates at an optimized conditions. The microstructural, optical and electrochromic properties of the as deposited WO3 films were investigated. The X-ray diffraction pattern of the film displayed characteristic triplet of (200), (020) and (002) Bragg reflections, in which (200) orientation is predominant and attributed to the monoclinic structure. The films were found to be smooth, uniform and composed with roughly spherically shaped nano grains of size in the range 60–70 nm. The as deposited WO3 films exhibited 85% of optical transmittance with evaluated optical band gap of 3.46 eV. The electrochromic studies were carried out for these WO3 films and observed to be 69% of optical modulation with colouration efficiency of 120 mC/cm2 at the wavelength of 550 nm.
机译:通过在优化条件下在ITO涂覆的基材上使用家庭建造的活性反应蒸发(IS)技术,沉积三氧化钨薄膜。研究了作为沉积WO3薄膜的微观结构,光学和电致变色特性。膜的薄膜显示特征三重胶片的X射线衍射图(200),(020)和(002)布拉格反射,其中(200)取向是主要的并且归因于单斜晶体结构。发现薄膜光滑,均匀,并以大致球形的纳米颗粒组成,尺寸为60-70nm。作为沉积的WO3薄膜表现出85%的光学透射率,评价为3.46eV的光带隙。对这些WO3膜进行电致变色研究,并观察到69%的光学调制,在550nm波长下具有120mc / cm2的着色效率。

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