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Electrochromic properties of amorphous and crystalline WO3 thin films prepared by thermal evaporation technique

机译:热蒸发技术制备的非晶态和晶体WO3薄膜的电致变色性能

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The tungsten trioxides thin films were deposited by thermal evaporation method onto indium tin oxides coated onto glass substrates. The structural properties of the films were investigated by X-ray diffractometer and atomic force microscopy techniques. The as-deposited film shows a polycrystalline nature related to indium tin oxides planes and the WO3 planes appears by annealing film to 773 K for 2 h. The 2D and 3D images were carried out using atomic force microscopy techniques. The film color is converted from transparent to deep blue color after applying electric field, and bleaching occurs by applying reverse electric field. The F-like color centers model was used to investigate the coloration in amorphous films. On the other hand, the crystalline films were characterized by the free carrier absorption mechanism. Both coloration response and coloration efficiency for the amorphous films are greater than crystalline. The coloration efficiency is found to be 31.25 cm(2)/C for the as-deposited films and decreases to 18.3 cm(2)/C by annealing films at 723 K. (C) 2014 Elsevier Ltd. All rights reserved.
机译:通过热蒸发法将三氧化钨薄膜沉积到涂覆在玻璃基板上的铟锡氧化物上。用X射线衍射仪和原子力显微镜技术研究了薄膜的结构性能。沉积后的薄膜显示出与铟锡氧化物平面相关的多晶性质,并且通过将薄膜退火至773 K 2 h而出现WO3平面。使用原子力显微镜技术执行2D和3D图像。施加电场后,薄膜颜色会从透明颜色转换为深蓝色,而施加反向电场则会发生漂白现象。使用类似F的色心模型来研究非晶膜中的着色。另一方面,结晶膜的特征在于自由载流子吸收机理。无定形膜的着色响应和着色效率均大于晶体。发现沉积后的薄膜的着色效率为31.25 cm(2)/ C,通过在723 K下对膜进行退火使着色效率降低至18.3 cm(2)/ C。(C)2014 Elsevier Ltd.保留所有权利。

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