Transmitted Small Angle X-Ray Scattering Intensity Enhancement with a Designed Grating

摘要

A simple technique was proposed to amplify the scattering intensities from a target grating in transmission small angle X-ray scattering measurements. The details of the amplification depend strongly on the alignment of the enhancement grating (Al grating) with respect to the target Si grating as being described theoretically and demonstrated experimentally. This scheme of intensity amplification holds the promise to facilitate the use of tSAXS for HVM in semiconductor industries. In addition the results presented in this work demonstrate that tSAXS can also be used as an high precision overlay metrology.