High Precision X-Ray Multilayer Mirrors For Customized Solutions

摘要

The analysis of materials with X-rays is well introduced to science and industry. Two major applications are the characterization of thin films by various kinds of X-ray diffraction methods, and non-destructive imaging of heterogeneous structures with X-ray imaging methods, in particular X-ray microscopy to visualize microscopic features non-destructively. In most cases, the X-ray beam needs to be tailored with suitable X-ray optics to enhance the performance and to allow for suitable working distances. X-ray multilayer mirrors are often first choice for the application at typical laboratory X-ray sources since a beam with a requested dimension and divergence can be provided and a sufficient monochromatization is achieved. We show a typical workflow of the optimization and examples from the fabrication of X-ray multilayer mirrors for specific applications.