首页> 外文会议>International Conference on Frontiers of Characterization and Metrology for Nanoelectronics >QUANTIFICATION OF HAFNIUM IN HAFNIUM OXIDE FILM BY ISOTOPE DILUTION NEUTRON ACTIVATION ANALYSIS
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QUANTIFICATION OF HAFNIUM IN HAFNIUM OXIDE FILM BY ISOTOPE DILUTION NEUTRON ACTIVATION ANALYSIS

机译:同位素稀释中子活化分析定量氧化铪膜中铪铪的定量

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摘要

Hafnium amounts in hafnium oxide films were quantified as area densities through ID-NAA. The results demonstrated that ID-NAA is applicable for the precise methodology for semiconductor-device manufacturers.
机译:氧化铪膜中的铪量被定量为通过ID-NAA的面积密度。结果表明ID-NAA适用于半导体器件制造商的精确方法。

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