Design and fabrication of compact etched diffraction grating demultiplexers based on α-Si nanowire technology

机译：基于α-Si纳米线技术的紧凑型衍射光栅多路分解器的设计与制造

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Silicon nanowire waveguides and related etched diffraction grating (EDG) demultiplexers are studied by α-Si-on-SiO{sub}2 technology. Compact EDG demultiplexers with 10nm spacing for both echelle and total-internal-reflection (TIR) facets have been fabricated and characterized.

机译：通过α-Si-on-SiO {Sub} 2技术研究了硅纳米线波导和相关蚀刻的衍射光栅（EDG）多路分解器。具有10nm间距的紧凑型EDG多路分解器，用于梯度和全内反射（TIR）刻面，并表征。

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《IEEE/LEOS International Conference on Optical MEMS and Nanophotonics》|2008年||共2页
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Jun Song; Ning Zhu;
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中图分类 TN29-53;
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1. Design and fabrication of compact etched diffraction grating demultiplexers based on a-Si nanowire technology [J] . Song J., Zhu N. Electronics Letters . 2008,第13期

机译：基于a-Si纳米线技术的紧凑型刻蚀衍射光栅解复用器的设计与制造
2. Design and fabrication of compact etched diffraction grating demultiplexers based on α-Si nanowire technology [J] . J. Song, N. Zhu Electronicsletters . 2008,第13期

机译：基于α-Si纳米线技术的紧凑型刻蚀衍射光栅解复用器的设计与制造
3. Silicon-on-Insulator-Based Compact Optical Demultiplexer Employing Etched Diffraction Grating [J] . Wang Wen-Hui, Tang Yan-Zhe, Wang Yun-Xiang, Chinese physics letters . 2004,第7期

机译：基于绝缘体上硅的紧凑型光解复用器，采用蚀刻衍射光栅
4. Design and fabrication of compact etched diffraction grating demultiplexers based on α-Si nanowire technology [C] . Jun Song, Ning Zhu IEEE/LEOS International Conference on Optical MEMS and Nanophotonics . 2008

机译：基于α-Si纳米线技术的紧凑型衍射光栅多路分解器的设计与制造
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6. Design Optimization and Fabrication of High-Sensitivity SOI Pressure Sensors with High Signal-to-Noise Ratios Based on Silicon Nanowire Piezoresistors [O] . Jiahong Zhang, Yang Zhao, Yixian Ge, 2016

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Design and fabrication of compact etched diffraction grating demultiplexers based on α-Si nanowire technology

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