Application of laser plasma soft x-ray and EUV sources in micro- and nanotechnology

摘要

Results on micro- and nanoprocessing of organic polymers using X-rays and extreme ultraviolet (EUV) generated from laser-plasma radiation sources are presented in the paper. The sources used in the studies are based on the gas puff target approach developed at the Institute of Optoelectronics, Warsaw. Processing of polymers is connected with non-thermal ablation under the influence of energetic photons of X-ray and EUV radiation. The process can be useful for practical applications as it makes possible to produce structures with sub-micron spatial resolution that is not possible using the thermal ablation. The new technology will be used for production of photonic microstructures and for modification of polymer surfaces for biomedical applications.