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EUV, XUV, and X-ray wavelength sources created from laser plasma produced from liquid metal solutions

机译:由液态金属溶液产生的激光等离子体产生的EUV,XUV和X射线波长源

摘要

Metallic solutions at room temperature used a laser point source target droplets. Using the target metallic solutions results in damage free use to surrounding optical components since no debris are formed. The metallic solutions can produce plasma emissions in the X-rays, XUV, and EUV(extreme ultra violet) spectral ranges of approximately 11.7 nm and 13 nm. The metallic solutions can include molecular liquids or mixtures of elemental and molecular liquids, such as metallic chloride solutions, metallic bromide solutions, metallic sulphate solutions, metallic nitrate solutions, and organo-metallic solutions. The metallic solutions do not need to be heated since they are in a solution form at room temperatures.
机译:室温下的金属溶液使用激光点源靶向液滴。使用目标金属溶液可避免损坏周围的光学组件,因为不会形成碎屑。金属溶液可以在大约11.7 nm和13 nm的X射线,XUV和EUV(极紫外)光谱范围内产生等离子体发射。金属溶液可以包括分子液体或元素液体和分子液体的混合物,例如金属氯化物溶液,金属溴化物溶液,金属硫酸盐溶液,金属硝酸盐溶液和有机金属溶液。金属溶液无需加热,因为它们在室温下呈溶液形式。

著录项

  • 公开/公告号US2006291627A1

    专利类型

  • 公开/公告日2006-12-28

    原文格式PDF

  • 申请/专利权人 MARTIN RICHARDSON;

    申请/专利号US20060503703

  • 发明设计人 MARTIN RICHARDSON;

    申请日2006-08-14

  • 分类号H05G2/00;G21G4/00;H01J35/00;

  • 国家 US

  • 入库时间 2022-08-21 21:03:31

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