首页> 外国专利> Euv, xuv, and x-ray wavelength sources created from laser plasma produced from liquid metal solutions, and nano-size particles in solutions

Euv, xuv, and x-ray wavelength sources created from laser plasma produced from liquid metal solutions, and nano-size particles in solutions

机译:Euv,xuv和x射线波长源是由液态金属溶液产生的激光等离子体以及溶液中的纳米级颗粒产生的

摘要

Special liquid droplet targets that are irradiated by a high power laser and are plasmarized to form a point source EUV, XUV and x-ray source. Various types of liquid droplet targets include metallic solutions, and nano-sized particles in solutions having a melting temperature lower than the melting temperature of some or all of the constituent metals, used a laser point source target droplets. The solutions have no damaging debris and can produce plasma emissions in the X-rays, XUV, and EUV(extreme ultra violet) spectral ranges of approximately 0.1 nm to approximately 100 nm, approximately 11.7 nm and 13 nm, approximately 0.5 nm to approximately 1.5 nm, and approximately 2.3 nm to approximately 4.5 nm. The second type of target consists of various types of liquids which contain as a miscible fluid various nano-size particles of different types of metals and non-metal materials.
机译:特殊的液滴目标被高功率激光照射并被等离子体化,以形成点源EUV,XUV和X射线源。各种类型的液滴靶包括金属溶液,以及溶液中的纳米尺寸的颗粒,其熔点低于某些或全部构成金属的熔点,使用激光点源靶液滴。该解决方案没有破坏性的碎片,并且可以在大约0.1 nm至大约100 nm,大约11.7 nm和13 nm,大约0.5 nm至大约1.5的X射线,XUV和EUV(极紫外)光谱范围内产生等离子体发射约2.3nm至约4.5nm。第二类型的靶由各种类型的液体组成,这些液体包含各种类型的金属和非金属材料的各种纳米尺寸的颗粒作为可混溶流体。

著录项

  • 公开/公告号AU4180402A

    专利类型

  • 公开/公告日2002-06-18

    原文格式PDF

  • 申请/专利权人 UNIVERSITY OF CENTRAL FLORIDA;

    申请/专利号AU20020041804

  • 发明设计人 MARTIN RICHARDSON;

    申请日2001-10-19

  • 分类号H05H1/24;H01L21/027;H05G2/00;

  • 国家 AU

  • 入库时间 2022-08-22 00:39:48

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