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MOTION CONTROL FOR NANO LITHOGRAPHY

机译:纳米光刻的运动控制

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This paper presents some motion control issues that we are addressing in developing a control system for a multi-degree-of-freedom stage designed for nano-imprint-lithography. We describe the motion control software and hardware configuration, and model the coordinate transformation among the spaces of sensors, stage position, and actuators. A characteristic problem that is common to many electric motor driven stages including the one we are working on is the excess number of motors and coils to the stage's kinematic degrees of freedom render a redundant system. To reduce thermal deformation of the work space by the heat generated by the motors, this redundancy is exploited. In minimizing the total electric power of the motors for a given force vector command from the servo controller we derive an interesting result that are general to common systems. Two formulations, one without and one with additional constraint for geometrically symmetric thermal deformation, for total motor heat minimization are considered. We will also present our initial PID servo control experimental result and discuss work in progress to further eliminate the servo errors in the PID loop.
机译:本文介绍了一些运动控制问题,我们正在开发用于为纳米印记光刻设计的多程度自由阶段进行控制系统。我们描述了运动控制软件和硬件配置,并模拟了传感器,舞台位置和执行器的空间之间的坐标变换。在包括我们正在处理的许多电动机驱动阶段的特征问题是对阶段的运动程度和线圈的多个电动机和线圈呈现给阶段的运动程度,渲染冗余系统。为了通过电动机产生的热量减少工作空间的热变形,利用这种冗余。在最小化来自伺服控制器的给定力矢量命令的电动机的总电力中,我们推导出一种普遍的常用系统的有趣结果。考虑了两种制剂,一个没有和具有用于几何对称热变形的额外约束的制剂,用于总电机热量最小化。我们还将介绍我们的初始PID伺服控制实验结果,并讨论正在进行的工作,以进一步消除PID环路中的伺服错误。

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