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Kinetics of the Formation of Poly(methyldecylsiloxane) by Hydrosilylation of Poly(methylhydrosiloxane) and 1-Decene

机译:聚(甲基氢硅氧烷)和1-癸烯的氢化硅烷化形成聚(甲基二烷基硅氧烷)的动力学

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Poly(methylhydrosiloxane) [PMHS], prepared by siloxane equilibration reaction, was used for the hydrosilylation with 1-decene to obtain poly(methyldecylsiloxane) [PMDS]. Pt(0)-1,3-divinyltetramethyldisiloxane complex was used as a catalyst for hydrosilylation reaction. In order to investigate the kinetics of the formation of PMDS, a series of experiments was performed at different reaction temperatures (from 48 to 64 °C) with catalyst concentrations of 7.0 · 10~(-7) mol of Pt per mol of CH=CH_2. All reactions were carried out in bulk, with equimolar amounts of the reacting Si-H and CH=CH_2 groups. The course of the reactions was monitored by following the disappearance of the Si-H bands by quantitative infrared spectroscopy. The obtained results show that an induction period occurs at lower reaction temperatures and that the rate of Si-H conversion follows the first-order kinetics.
机译:通过硅氧烷平衡反应制备的聚(甲基氢硅氧烷)[PMH]用于用1-切除液加氢硅烷化,得到聚(甲基二烷基硅氧烷)[PMD]。 Pt(0)-1,3-二乙烯基二甲基二硅氧烷复合物用作氢化硅烷化反应的催化剂。为了探讨PMDS形成的动力学,在不同的反应温度(48至64℃)下进行一系列实验,催化剂浓度为每摩尔CH = 0.0·10〜(-7)摩尔PT的催化剂浓度CH_2。所有反应均在块状中进行,等摩尔量的反应Si-H和CH = CH_2基团。通过通过定量红外光谱通过遵循Si-H带的消失来监测反应的过程。得到的结果表明,在较低的反应温度下发生诱导期,并且Si-H转换的速率遵循一阶动力学。

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