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THIN FILM CARBON LAYERS WITH CONTINOUSLY CHANGING BONDING PROPERTIES

机译:薄膜碳层具有连续变化的粘接性能

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Polycrystalline diamond and diamond-like carbon (DLC) films were deposited by microwave chemical vapor deposition (MW-CVD) and by pulsed laser deposition (PLD) respectively. Ar ion bombardment was used to change the properties of these layers. The sp~2 bonds were determined directly by reflected electron energy loss spectroscopy (REELS) and further characterization was made by Raman scattering. The polycrystalline diamond showed only very slight Π-Π~* transition at 6.5 eV, but after Ar ion bombardment strong peak was formed but definitely shifted to lower energy compared to the well known Π-Π~* transition of graphite. The as deposited PLD carbon films showed broad peak around 5eV clearly different than the Π-Π~* transition (6.5eV). After Ar~+ ion bombardment the peak was shifted also to lower energy range (4-5eV) with a remaining part at 6.5eV. The lower energy part of the peak can be correlated to the transition of sp~3 sites, while this change in peak position was not detectable after ion bombardment of the reference HOPG sample, which does not contain sp3 hybridized carbon atoms.
机译:通过微波化学气相沉积(MW-CVD)和脉冲激光沉积(PLD)沉积多晶金刚石和金刚石碳(DLC)膜。 AR离子轰击用于改变这些层的性质。通过反射电子能损光谱(卷轴)直接测定SP〜2键,并通过拉曼散射进行进一步表征。多晶金刚石仅在6.5eV时显示出非常轻微的π-π〜*过渡,但与众所周知的π-π〜*相比,形成了强烈的峰值,但与石墨的众所周知的π-π〜*相比,绝对地移动到较低的能量。作为沉积的PLD碳膜显示宽峰5eV,明显不同于π-π〜*过渡(6.5eV)。在AR〜+离子轰击之后,峰值也转移到较低的能量范围(4-5EV),剩余部分在6.5EV。峰的较低能量部分可以与SP〜3位点的转变相关,而在离子轰击的参考HOPG样品的离子轰击后,该峰位置的变化是不可检测的,这不含SP3杂交的碳原子。

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