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Degradation of Copper / Silver Alloy Thin Films Induced by Annealing

机译:退火诱导铜/银合金薄膜的降解

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Copper / silver alloy thin films form with a fine, polycrystalline, metastable crystal structure. The expected effects of annealing include grain growth, transformation into the two stable phases, coarsening of the phases, texture formation, and the formation and growth of pinholes or voids. Copper/silver alloy films were deposited on single crystal sodium chloride substrates, via pulsed laser deposition ablation of an alloy target, of the eutectic composition. Free-standing films of 20-30 nm thickness were studied as-deposited and after annealing on copper TEM grids at 100°C for various times. Although several of the expected degradation processes involve short-range diffusion - essentially single atomic jumps - these were not observed, while other, longer-range diffusion effects were clearly identifiable. In particular, void shrinkage was observed in the films at short times, and void growth occurred at longer times.
机译:铜/银合金薄膜形式,具有精细,多晶,亚料晶体结构。退火的预期效果包括晶粒生长,转化为两个稳定相,突出阶段,纹理形成和针孔或空隙的形成和生长。铜/银合金薄膜通过共晶组合物通过脉冲激光沉积消融沉积在单晶氯化钠基材上。在100°C的铜TEM网格上沉积和在100℃下进行两次,研究了20-30nm厚度的自卸式薄膜。虽然几个预期的降解过程涉及短程扩散 - 基本上单个原子跳跃 - 这些未观察到,而其他,更长范围的扩散效应明显可识别。特别地,在短时间内观察到在薄膜中观察到空隙收缩,并且在更长的时间内发生空隙生长。

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