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Interferometric characterization of MOEMS devices in cryogenic environment for astronomical instrumentation

机译:用于天文仪器的低温环境中MOEMS器件的干涉测量

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Next generation of infra-red astronomical instrumentation for space telescopes as well as ground-based extremely large telescopes requires MOEMS devices with remote control capability and cryogenic operation, including programmable multi-slit masks for multi-object spectroscopy (MOS). For the complete testing of these devices, we have developed in parallel and coupled a high-resolution Twyman-Green interferometer and a cryogenic-chamber for full surface and operation characterization. The interferometer exhibits a nanometer accuracy by using phase-shifting technique and low-coherence source. The cryogenic-chamber has a pressure as low as 10e-6 mbar and is able to cool down to 60K. Specific interfaces minimizing stresses for vacuum and cryo have been set. Within the framework of the European program on Smart Focal Planes, micro-mirrors have been selected for generating MOEMS-based slit masks. A first 5×5 micro-mirror array (MMA) with 100×200μm~2 mirrors was successfully fabricated using a combination of bulk and surface silicon micromachining. They show a mechanical tilting angle of 20° at a driving voltage below 100V, with excellent surface quality and uniform tilt-angle. The mirrors could be successfully actuated before, during and after cryogenic cooling. The surface quality of the gold coated micro-mirrors at room temperature and below 100K, when they are actuated, shows a slight increase of the deformation from 35nm peak-to-valley to 50nm peak-to-valley, due to CTE mismatch between silicon and gold layer. This small deformation is still well within the requirement for MOS application.
机译:下一代空间望远镜的红外天文仪表以及地面的极大望远镜需要遥控能力和低温操作的MoEMS器件,包括用于多对象光谱(MOS)的可编程多圈掩模。为了完全测试这些设备,我们已经并联开发并耦合了高分辨率的曲线 - 绿色干涉仪和低温室,用于全表面和操作表征。通过使用相移技术和低相干来源,干涉仪表现出纳米精度。低温室的压力低至10E-6曼巴,并且能够冷却至60K。已经设定了最小化真空和冷冻的应力的特定界面。在欧洲智能焦平面上的欧洲计划的框架内,已选择微镜用于生成基于MoEms的狭缝掩模。使用块状和表面硅微机械加工的组合成功制造了具有100×200μm〜2镜的前5×5微镜阵列(MMA)。它们在低于100V的驱动电压下显示出20°的机械倾斜角,具有优异的表面质量和均匀的倾斜角。可以在低温冷却之前,期间和之后成功启动镜子。由于硅之间的CTE不匹配,在室温和致动时,金涂层微镜的表面质量在室温下和低于100k时,显示出从35nm峰到谷到50nm峰到谷的变形。和金层。这种小变形仍然在MOS应用的要求中。

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