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Band gap reduction of ZnO for photoelectrochemical splitting of water

机译:水的光电化学分裂ZnO的带隙减少

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We combine first-principles density functional theory, material synthesis and characterization, and photoelectrochemical (PEC) measurements to explore methods to effectively reduce the band gap of ZnO for the application of PEC water splitting. We find that the band gap reduction of ZnO can be achieved by N and Cu incorporation into ZnO. We have successfully synthesized ZnO:N thin films with various reduced band gaps by reactive RF magnetron sputtering. We further demonstrate that heavy Cu-incorporation lead to both p-type doping and band gap significantly reduced ZnO thin films. The p-type conductivity in our ZnO:Cu films is clearly revealed by Mott-Schottky plots. The band gap reduction and photoresponse with visible light for N- and Cu-incorporated ZnO thin films are demonstrated.
机译:我们结合了一原子密度函数理论,材料合成和表征,以及光电化学(PEC)测量以探索有效降低ZnO带隙的方法,以应用PEC水分裂。我们发现ZnO的带隙减少可以通过N和Cu掺入到ZnO中来实现。我们已经成功地合成了ZnO:N薄膜,通过反应性RF磁控溅射具有各种减小的带间隙。我们进一步证明,重铜掺入导致P型掺杂和带隙显着减少ZnO薄膜。我们的ZnO中的p型导电性:Mott-肖特基图清楚地揭示了Cu薄膜。证明了具有用于N-和Cu合并ZnO薄膜的可见光的带隙和光响应。

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