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Synthesis and characterization of band gap-reduced ZnO:N and ZnO:(Al,N) films for photoelectrochemical water splitting

机译:带隙减少的ZnO:N和ZnO:(Al,N)薄膜的制备及表征

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摘要

ZnO thin films with significantly reduced band gaps were synthesized by doping N and codoping Al and N at 100 ℃. All the films were synthesized by radiofrequency magnetron sputtering on F-doped tin-oxide-coated glass. We found that codoped ZnO: (Al,N) thin films exhibited significantly enhanced crystallinity compared with ZnO doped solely with N, ZnO:N, at the same growth conditions. Furthermore, annealed ZnO:(Al,N) thin films exhibited enhanced N incorporation over ZnO:N films. As a result, ZnO:(Al,N) films exhibited better photocurrents than ZnO:N films grown with pure N doping, suggesting that charge-compensated donor-acceptor codoping could be a potential method for band gap reduction of wide-band gap oxide materials to improve their photoelectrochemical performance.
机译:通过在100℃掺杂N和共掺杂Al和N来合成带隙明显减小的ZnO薄膜。所有的薄膜都是通过射频磁控溅射在掺​​F的氧化锡涂层玻璃上合成的。我们发现,在相同的生长条件下,与仅掺杂有N,ZnO:N的ZnO相比,共掺杂的ZnO:(Al,N)薄膜的结晶度显着提高。此外,退火的ZnO:(Al,N)薄膜比ZnO:N薄膜显示出更高的N掺入率。结果,ZnO:(Al,N)薄膜显示出比纯N掺杂生长的ZnO:N薄膜更好的光电流,这表明电荷补偿的供体-受体共掺杂可能是减少宽带隙氧化物的带隙的一种潜在方法。材料以改善其光电化学性能。

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  • 来源
    《Journal of Materials Research 》 |2010年第1期| 69-75| 共7页
  • 作者单位

    National Renewable Energy Laboratory, Golden, Colorado 80401 New Jersey Institute of Technology, Newark, New Jersey 07102;

    Energy & Environment Laboratory, Samsung Advanced Institute of Technology, Yongin-si, Gyeonggi-do 446-712, Republic of Korea;

    National Renewable Energy Laboratory, Golden, Colorado 80401;

    National Renewable Energy Laboratory, Golden, Colorado 80401;

    New Jersey Institute of Technology, Newark, New Jersey 07102;

    National Renewable Energy Laboratory, Golden, Colorado 80401;

    National Renewable Energy Laboratory, Golden, Colorado 80401;

    National Renewable Energy Laboratory, Golden, Colorado 80401;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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