Effect of strain on the magneto-transport properties of Co/Ag multiplayer films grown by pulse electrochemical deposition

摘要

We report magnetoresistance effect of nano-order scale [Co 1.0 nm/Ag (t{sub}Ag)] {sub}20 ferromagnetic multilayer and alloy films grown with pulse electrochemical deposition on top of a thin conducting layer of Cu (15 nm). The Cu-buffer layer was grown on a polyamide substrate (1 cm{sup}2) and annealed. A strain was applied mechanically to study the electrical and magnetic characteristics as a function of the ferromagnetic layer thickness. An induced magnetic anisotropy was observed in the entire films. The magnetoresistance ratio [R{sub}H-R{sub}0]/R{sub}0 was～9% at 1 kOe. A remarkable difference of magnetic field dependence of magnetoresistance ratio was observed corresponding to the orientation of magnetization curves. We suggest that these effects are due to the spin-dependent scattering at interface and/or domain boundaries.