Magnetoresistance effect, Magnetism, and Microstructure in Co-Au Granular Alloy Films Produced By Pulsed Electrochemical deposition

摘要

This paper discusses the relationship among the magneto-resistance (MR), magnetic properties, and microstructure of the Co-Au granular alloy prepared by pulsed electrochemical deposition. It is shown that MR ratio of the Co-Au single layer (100 nm) film deposited at the current density of 5 mA/cm{sup}2 increases with increasing Co concentration in the film and reaches a maximum of 4.4% at 40at%Co. It is observed that both the MR ratio and grain sizes in the films are dependent on the current density values.