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Grey scale electron-beam lithography in functionalized SU-8 for active optical devices

机译:用于有源光学装置的功能化SU-8中的灰度电子束光刻

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Miniaturized, single mode polymer dye lasers are realized by means of grey scale electron beam lithography (EBL) in functionalized SU-8 2000 resist, doped with Rhodamine 6G laser dye. These devices offer the possibility of easy integration of single mode laser sources in polymer based lab-on-a-chip microsystems. The demonstrated laser device consists of a planar waveguide with a 1st-order distributed feedback grating (DFB) surface corrugation, which forms an optical resonator. When optically pumped at 532 nm, single mode lasing is obtained in the wavelength range 570 nm - 630 nm, determined by the grating period. Our results demonstrate the feasibility of fabricating advanced nano-structured active optical components in a rapid prototyping process.
机译:小型化,单模聚合物染料激光器通过灰度电子束光刻(EBL)在官能化SU-8 2000抗蚀剂中实现,掺杂有罗丹明6G激光染料。这些设备提供了在基于聚合物的实验室微系统中轻松集成的单模激光源。所示的激光装置包括具有第一阶分布式反馈光栅(DFB)表面波纹的平面波导,其形成光学谐振器。当在532nm处光学泵送时,在波长范围570nm-630nm中获得单模激光,由光栅周期确定。我们的结果表明,在快速原型工艺中制造先进的纳米结构有源光学部件的可行性。

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