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A Novel Magnetic Micro Deflector of Electron Beam Control for Electron Beam Microcolumn Systems

机译:电子束微柱系统电子束控制的新型磁微偏转器

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This abstract presents a novel micro-machined magnetic deflector for controlling electron beam deflection in an electron beam microcolumn system (EBMS). Research on miniaturized EBMS has drawn many interests in recent years because of its wide applications in various fields, such as E-beam nano-lithography, portable electron microscope, micro-CRT (cathode-ray tube), and biomedical instruments [1][2]. Electron beam deflection or scanning is one of important factors influencing the ultimate performance of an electron beam microcolumn system. Traditionally, there are two kinds of mechanisms employed in EBMS to control the electron beam deflection. They are electrostatic deflector and magnetic deflector, respectively. Compared to electrostatic deflector, magnetic deflector has much lower aberrations. Using micro-fabricated magnetic deflector can largely improve the scan linearity, field, speed, and meanwhile reduce the size and fabrication cost of EBMS.
机译:该摘要介绍了一种用于控制电子束微柱系统(EBMS)中的电子束偏转的新型微机器磁偏转器。近年来,小型化EBMS的研究由于其在各种领域的广泛应用,例如电子束纳米光刻,便携式电子显微镜,微CRT(阴极射线管)和生物医学仪器[1] [1] [1] 2]。电子束偏转或扫描是影响电子束微柱系统的最终性能的重要因素之一。传统上,EBM中使用两种机构来控制电子束偏转。它们分别是静电偏转器和磁性偏转器。与静电偏转器相比,磁性偏转器具有远低劣的像差。使用微制成的磁偏转器可以大大改善扫描线性,场,速度,同时降低EBMS的尺寸和制造成本。

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