Electron beam radiation device, has deviation control that initiates deflector and deviates electron beam produced from electron gun based on deviation amount of electron beam, and deflector that diffracts electron beam

摘要

The device has an electron gun (101) for producing an electron beam, a deflector for diffracting the beam, and a semiconductor wafer platform, on which a semiconductor wafer is placed. A platform position detector finds the position of the platform. A platform position computing unit for computing the motion speed of the platform, based on a distance over which the platform moves and on a time required to move the platform over the distance. A deviation control initiates the deflector, and deviates the beam based on the deviation amount of the beam. The computing unit is also provided for computing the amount of position change of the platform with respect to an interpolation time.