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Evidence of Carrier Mediated Ferromagnetism in GaN:Mn/GaN:Mg Heterostructures

机译:载体介导的GaN中的载体介导的铁磁性:Mn / GaN:Mg异质结构

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Dilute Magnetic Semiconductors (DMS's) posses a strong potential to make use of the spin of carriers in spintronic devices.Experimental results and theoretical calculations predict that GaN:Mn is a potential semiconductor material for spintronic device applications.The dependence of the room temperature ferromagnetic properties of GaN:Mn/GaN:Mg double heterostructures (DHS) on the Fermi level position in the crystal is demonstrated.Several GaN:Mn/GaN:Mg DHS are grown by metal organic chemical vapor deposition on sapphire.It is shown that initially paramagnetic films can be rendered ferromagnetic by facilitating carrier transfer through the GaN:Mn/GaN:Mg interface.Additionally,it is demonstrated that ferromagnetism depends on the thickness of the GaN:Mn and GaN:Mg layers.The carrier transfer process essentially changes the Fermi level position in the crystal.By choosing the right thicknesses for GaN:Mn and GaN:Mg an optimum DHS that exhibits room temperature ferromagnetism is grown.An identical structure,with the exception of insertion of an AlGaN barrier in order to obstruct the carrier transfer at the interface,results in paramagnetic films for AlGaN barriers thicker than 25nm.These results are explained based on the change in the occupancy of the 3d-Mn impurity band,and indicate that carrier mediation is the possible mechanism for the ferromagnetism observed in the MOCVD grown GaN:Mn material system.This is the first evidence that this material system responds to electronic perturbations,hence ferromagnetism observed is not due to secondary phases or spin glass behavior.
机译:稀磁性半导体(DMS的)拥有一种强大的潜力,使用在自旋电子devices.Experimental结果和理论计算载流子的自旋的预测的GaN:Mn是对自旋电子器件的电势的半导体材料的室温铁磁特性的applications.The依赖性GaN组成:锰/ GAN:在晶体中的费米能级位置镁双异质(DHS)是demonstrated.Several的GaN:锰/ GAN:镁DHS是通过在金属sapphire.It有机化学气相沉积生长的结果表明,最初的顺磁的Mn / GAN:薄膜可以通过在GaN促进载体传输呈现铁磁镁interface.Additionally,据证实铁磁性依赖于GaN的厚度:Mn和氮化镓:镁layers.The载波传输过程基本上改变费米在crystal.By水平位置选择为氮化镓右厚度:Mn和氮化镓:Mg的最佳DHS表现出室温铁磁性是grown.An我dentical结构,具有AlGaN势垒的插入,以便阻碍在界面处的载流子移动的例外,在比25nm.These结果厚的AlGaN障碍顺磁性膜的结果进行说明基于在3D-Mn的占用的变化杂质带,并表明载体调解是在MOCVD生长的GaN所观察到的铁磁性的可能机制:Mn原料系统。这是第一个证据,该材料系统响应于电子的扰动,因此,观察到铁磁性不是由于第二相或自旋玻璃行为。

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