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Intersubband Transitions in GaN/Al_xGa_(1-x)N Multi Quantum Wells

机译:GaN / AL_XGA_(1-x)n多量子阱的INTSUBBAND转换

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Intersubband transitions (ISTs) in GaN/Al_xGa_(1_x)N multiple quantum wells (MQWs) were investigated using an optical absorption technique. Several samples were grown by either Molecular Beam Epitaxy (MBE) or Metal-Organic Chemical Vapor Deposition (MOCVD) and were investigated using both normal incident and waveguide configurations. The waveguides were fabricated by dicing each sample into 2 mm wide by 5 mm long pieces with two facets polished at 45 degrees with respect to the surface such that light propagates across the sample's width. Preliminary results indicate that ISTs are observable in Si-doped and undoped GaN/Al_xGa_(1-x)N MQWs. The source of these charge carriers in the undoped samples are explained as being due to the spontaneous polarization effect which exists at the GaN/Al_xGa_(1-x)N interfaces where the GaN surface has Ga-polarity. Scanning Electron Microscopy indicates that a sample containing what appeared to be a large number of cracks and or hexagonal voids lacked the presence of TSTs.
机译:使用光学吸收技术研究了GaN / AL_XGA_(1_X)N多量子阱(MQW)中的血管粗磨机转换(ISTS)。通过分子束外延(MBE)或金属 - 有机化学气相沉积(MOCVD)生长几种样品,并使用正常的入射和波导构造研究。通过将每个样品切割成2mm宽的5mm长的块来制造波导,其中两个刻面相对于表面为45度,使得光在样品的宽度上传播。初步结果表明,在Si-掺杂和未掺杂的GaN / Al_xga_(1-x)n MQWS中可观察到ists。未掺杂的样品中的这些电荷载体的源是由于GaN表面存在于GaN表面的GaN / Al_xga_(1-x)n个界面存在的自发极化效果。扫描电子显微镜表明,含有似乎大量裂缝和或六边形空隙的样品缺乏TST的存在。

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