首页> 外文会议>China International Conference on High-Performance Ceramics >Oxidation Behaviors of TiB_2-TiC_x and TiB_2-TiC_x/15SiC Ceramics
【24h】

Oxidation Behaviors of TiB_2-TiC_x and TiB_2-TiC_x/15SiC Ceramics

机译:TIB_2-TIC_X和TIB_2-TIC_X / 15SIC陶瓷的氧化行为

获取原文

摘要

Fully dense samples of TiB_2-TiC_X and TiB_2-TiC_X/15SiC ceramic composites were fabricated by in-situ synthesis under hot isostatic pressing from TiH_2, B_4C and SiC powders. Their oxidized behaviors at different temperatures were tested. Optical micrograph studies and thermo-gravimetric analyses show that the highest effective temperature of oxidation resistance is 700°C for TiB_2-TiC_x, and 1100°C for TiB_2-TiC_x/15SiC. The weight gain of TiB_2-TiC_x/15SiC below 1100°C is quite low, and it rises up suddenly when the temperature reaches 1200°C. Thus, the highest effective temperature of oxidation resistance is 1100°C for TiB_2-TiC_x/15SiC. The oxidation dynamic curves of TiB_2-TiC_x/15SiC ceramics accord with the parabola's law. The activation energy of TiB_2-TiC_X/15SiC (189.87kJ.mol~(-1)) is higher than that of TiB_2-TiCx (96.44kJ.mol~(-1)). In the oxidation process of TiB_2-TiCx/15SiC, TiB_2 reacts with oxygen and generates TiO_2 and B_2O_3 at first. A layer of whole homogeneous oxide film cannot be formed, in the mean time, the oxidation of TiC begins. When temperature goes up to 1000°C, TiC phase is totally oxidized. SiC is oxidized to SiO_2 at about 900°C, Meanwhile, TiO_2 forms denser film than B_2O_3, which grows and covers the surface of the material, and gives better property of oxidation resistance.
机译:通过从TIH_2,B_4C和SiC粉末的热等静压下原位合成通过原位合成制造全致密的Tib_2-TiC_X和TIB_2-TIC_X / 15SIC陶瓷复合材料。测试了不同温度的氧化行为。光学显微照片和热重分析表明,TIB_2-TIC_X的最高有效温度为700°C,对于TIB_2-TIC_X / 15SIC,1100°C为110​​0°C。在1100°C以下TIB_2-TIC_X / 15SIC的重量增益非常低,当温度达到1200°C时,它突然上升。因此,对于TIB_2-TIC_X / 15SIC,抗氧化性的最高有效温度为1100℃。 TIB_2-TIC_X / 15SIC陶瓷的氧化动态曲线与Parawola法律符合。 TIB_2-TIC_X / 15SIC的激活能量(189.87KJ.mol〜(-1))高于TIB_2-TICX(96.44KJ.mol〜(-1))。在TIB_2-TICX / 15SIC的氧化过程中,TIB_2在氧气反应并首先产生TiO_2和B_2O_3。在平均时,不能形成一层整个均匀的氧化膜,而TIC的氧化开始。当温度高达1000℃时,TIC相完全氧化。 SiC在约900℃下氧化至SiO_2,同时TiO_2形成小于B_2O_3的密集膜,其生长并覆盖材料的表面,并提供更好的抗氧化性性能。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号