首页> 外文会议>Annual International Technical Conference >Automatic Control of the Solution in Trivalent Chromium Plating Process
【24h】

Automatic Control of the Solution in Trivalent Chromium Plating Process

机译:三价铬电镀过程中溶液的自动控制

获取原文

摘要

Stable operation of chromium plating solutions based on trivalent-chromium compounds needs continuous or frequent replenishment: additions of chromium salts and alkalies. It leads to excessive built-up of salts (e.g. sodium or ammonium sulfate). A combination of two anodes placed in two half-cells with appropriate ion-exchange membranes enables easy and economic automatic control of the concentrations of chromium ions, sulfates and pH-value in the plating solution. Any losses of organic components, such as formic acid, and formation of chromate due to anodic oxidation are also eliminated. Higher cathodic current efficiency is reached due to the prevention of the incomplete reduction of Cr{sup}(3+) to Cr{sup}(2+) followed by the reverse anodic oxidation of Cr{sup}(2+) to Cr{sup}(3+).
机译:基于三价铬化合物的铬镀液稳定运行需要连续或频繁补充:添加铬盐和碱。它导致过度盐的盐(例如硫酸钠或硫酸铵)。将两个阳极组合在具有适当的离子交换膜中的两个半电池中,使得能够容易和经济地自动控制镀液中铬离子,硫酸盐和pH值的浓度。还消除了任何有机组分的损失,例如甲酸,由于阳极氧化而形成铬酸盐。由于预防Cr {sup}(3+)至Cr {sup}(2+)的不完全还原而达到较高的阴极电流效率,然后是Cr {sup}(2+)的反向阳极氧化至cr { sup}(3+)。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号