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LASER ANNEALING OF AMORPHOUS NI-TI SHAPE MEMORY ALLOY THIN FILMS

机译:非晶态镍钛形记忆合金薄膜激光退火

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We have presented the results of a crystallization study on NiTi shape memory thin films in which amorphous films were annealed by scanning a laser across the surface of the film. Our results show that under the correct conditions of laser power density and scanning speed, it is indeed possible to crystallize the films. Moreover, X-ray diffraction clearly shows the formation of martensite in the crystallized sections of the film. The temperature profiles induced by the laser beam were calculated using a three-dimensional finite element model. The model takes into account the crystallization kinetics of amorphous NiTi and allows prediction of the size of the crystallized regions as a function of laser annealing parameters if the reflectivity of the NiTi surface is known. Our results further show that it is critical to minimize oxide growth during the laser-annealing process for good control of the process.
机译:我们介绍了对NITI形状记忆薄膜的结晶研究的结果,其中通过扫描膜的表面的激光来退火非晶膜。我们的结果表明,在激光功率密度和扫描速度的正确条件下,确实可以将薄膜结晶。此外,X射线衍射清楚地显示了薄膜结晶部分中马氏体的形成。通过三维有限元模型计算由激光束引起的温度分布。该模型考虑了无定形Niti的结晶动力学,并且如果Niti表面的反射率是已知的,则允许将结晶区域的尺寸预测为激光退火参数。我们的结果进一步表明,最大限度地减少激光退火过程中的氧化物生长至关重要,以良好地控制该过程。

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