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NI-TI SERIES SHAPE MEMORY ALLOY THIN FILM AND ITS MANUFACTURE

机译:NI-TI系列形状记忆合金薄膜及其制造

摘要

PURPOSE:To obtain the shape memory alloy thin film having a prescribed compsn. and transformation temp. by using an Ni-Ti series alloy in which the precipitates of Ti2Ni are uniformly dispersed as a target material and regulating its film thickness into a prescribed one by a sputtering method. CONSTITUTION:An Ni-Ti series shape memory alloy in which the precipitates of Ti2Ni are uniformly dispersed and constituted of, by weight, 44 to 50% Ni and the balance Ti is used as a target material. By using the target material, a thin film is formed on a substrate by a sputtering method. Then, the Ni-Ti series shape memory alloy thin film constituted of 49 to 51.5% Ni and the balance Ti and having 1mum to 1mm film thickness can be obtd.
机译:目的:获得具有规定组成的形状记忆合金薄膜。和转变温度通过使用其中Ti 2 Ni的析出物均匀分散的Ni-Ti系列合金作为靶材,并通过溅射法将其膜厚调节为规定的厚度。组成:一种Ni-Ti系列形状记忆合金,其中Ti2Ni的沉淀物均匀分散并由44%至50%的Ni组成,其余的Ti用作目标材料。通过使用靶材,通过溅射法在基板上形成薄膜。然后,可以去除由49〜51.5%的Ni和余量的Ti构成的膜厚为1μm〜1mm的Ni-Ti系列形状记忆合金薄膜。

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