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Optical investigation of AlGaN/GaN quantum wells and superlattices

机译:AlGaN / GaN量子井和超晶格的光学研究

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We report a detailed optical study of several sets of multiple quantum wells (MQWs) in the AlGaN/GaN system, as well as AlN/GaN superlattice (SL) structures. In this study all materials were grown by MOCVD, as opposed to most previous studies where MBE was employed. In undoped MQWs discrete photoluminescence (PL) peaks related to discrete well width fluctuations by one full c lattice parameter are clearly observed. In doped samples this effect appears to be screened. While the recombination process in undoped samples is excitonic, in MQWs doped with Si above about 5 x 10~(18) cm~(-3) free electrons (a 2DEG) are dominant, and the PL process is a free electrons-localized hole transition at low temperatures. The hole localization prevails up to very high n-doping, as was previously observed in bulk GaN. The hole localization is demonstrated via several experiments, including results on PL transient decay times and LO phonon coupling. Near surface band bending, due mainly to dopant depletion in doped structures or interaction with surface states in case of higher Al content in barriers, influences the distribution of electron filling among the QWs, making a detailed modeling of the spectral shape somewhat ambiguous. It is found that AlN barriers promote a strong room temperature PL signal from the QWs, as opposed to the case with AlGaN barriers.
机译:我们在AlGaN / GaN系统中报告了几组多量子阱(MQW)的详细光学研究,以及ALN / GaN超晶格(SL)结构。在这项研究中,所有材料都是MOCVD的,而不是最先前的研究,其中使用MBE。在未掺杂的MQWS中,清楚地观察到与离散井宽度波动有关的离散光致发光(PL)峰值被一个完整的C晶格参数波动。在掺杂的样品中,似乎筛选这种效果。虽然未掺杂的样品中的重组过程是激子,但在掺杂的MQW中,掺杂有约5×10〜(18)Cm〜(-3)游离电子(2deg)的Si是显性的,并且PL工艺是游离电子局部孔低温过渡。孔定位普遍存在于非常高的N掺杂,如前所述在散装GaN中观察到。通过几个实验证明了孔定位,包括PL瞬态衰减时间和LO源耦合的结果。近表面带弯曲,主要是由于掺杂结构或与表面状态相互作用的掺杂剂耗尽,在屏障中更高的Al含量,影响QWS中的电子填充物的分布,使得光谱形状的详细建模稍微模糊。结果发现,Aln屏障从QWS促进了一个强室温PL信号,而不是用AlGaN屏障的情况。

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