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Numerical analysis of the process-induced stresses in silicon microstructures

机译:硅微观结构中工艺诱导应力的数值分析

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摘要

Residual stresses can significantly affect the performances of silicon micro-structures. The understanding of the residual stress growth during their processing is of great importance. However, the experimental tracing of the stress at the various stages of the machining is still almost impossible. Quantitative modelling of these problems is the alternative to provide guidelines for the minimization of the residual stresses. In this paper, we describe a technology computer aided design homemade tool, IMPACT. The mechanical models and the numerical implementation are presented. We give details about our methodology to calibrate and validate our implementation. The originality of this study lies in (1) the capability to simulate almost all the sources of stress taking into account of the complex rheological behaviors of the materials, (2) the experimental determination of the mechanical properties of various thin film materials and (3) the validation of the calculations by direct comparisons with measured deformations in the micro-structures.
机译:残余应力可以显着影响硅微结构的性能。理解其处理过程中的残余压力增长是非常重要的。然而,在加工的各个阶段的应力的实验追踪仍然是不可能的。这些问题的定量建模是提供最小化残余应力的准则的替代方案。在本文中,我们描述了一种技术计算机辅助设计自制工具,影响。提出了机械模型和数值实现。我们详细介绍了我们的方法来校准并验证我们的实施。本研究的原创性在于(1)考虑到材料的复杂流变行为来模拟几乎所有的压力来源,(2)实验测定各种薄膜材料的机械性能和(3 )通过直接比较来验证计算微结构中的测量变形。

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