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Variation of Vaporized Coating Material in Free Plasma Jet of Plasma Spray-Physical Vapor Deposition Process

机译:等离子体喷雾物理气相沉积工艺自由等离子体射流汽化涂层材料的变化

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In the Plasma Spray-Physical Vapor Deposition (PS-PVD) process, the vapor atom of feedstock material is one deposition unit of the columnar structure coating. It is reported that the gas phase may be transformed into cluster when the powder feeding rate increases from small to large or the sedimentation distance increases from a certain distance to another distance. In order to understanding the variation of vaporized coating material in free plasma jet, the gaseous material capacity of plasma jet must be fundamentally understood. In this work, the thermal characteristics of plasma were firstly measured by optical emission spectrometry (OES). The results show that the free plasma jet is in the local thermal equilibrium due to a typical electron number density from 2.1 × 10~(15) to 3.1 × 10~(15) cm~(-3). In this condition, the temperature of gaseous zirconia can be equal to the plasma temperature. A model was developed to obtain the vapor pressure of gaseous ZrO_2 molecules as a two dimensional map of jet axis and radial position corresponding to different average plasma temperatures. The overall gaseous material capacity of free plasma jet was further established. At a position of plasma jet, clusters may form when the gaseous material exceeds local maximum gaseous material capacity.
机译:在等离子喷涂,物理气相沉积(PS-PVD)工艺,原料的蒸气原子是柱状结构涂层的一个沉积单元。据报道,气相可被转化到集群时从小送粉速率增大到大或沉降距离增加从到另一个距离一定距离。为了理解在无等离子体射流气化的涂层材料的变型中,等离子流的气态材料的容量必须从根本上理解。在这项工作中,等离子体的热特性通过光学发射光谱法(OES)为首次测定的。结果表明,自由等离子体射流是在局部热平衡由于从2.1×10〜(15),以3.1×10〜(15)厘米〜(-3)的典型电子数密度。在该状态下,气态的氧化锆的温度可以等于等离子体温度。模型的开发是为了获得气态ZrO_2分子的蒸气压射流轴线和对应于不同的平均的等离子体温度径向位置的二维图。进一步建立的无等离子体射流的总气态物质的能力。在等离子流的位置,当气态物质超过局部最大值气态材料容量簇可以形成。

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