首页> 外文会议>International Multi Topic Conference >Eliminating tie-down diodes in process technologies
【24h】

Eliminating tie-down diodes in process technologies

机译:消除过程技术中的束缚二极管

获取原文

摘要

In deep sub-micron process technologies tie-down diodes are used to prevent damage to the oxide layer due to charge build-up during fabrication. Tie-downs are reverse biased diodes to the substrate and are required for FET gates, PFET wells, bond-pads and MIM capacitor top and bottom plates. In normal operating conditions, these diodes must be kept in reverse biased condition. However, large bipolar signals may bias these protection diodes in forward direction resulting in considerable signal/power loss. This paper presents a novel way of eliminating the need of individual tie-down diodes especially at the output node, where bipolar signals may be present, such as in amplifier circuits. EM simulation results indicate that this technique does not degrade the overall circuit performance.
机译:在深层微米工艺技术中,束缚二极管用于防止由于在制造期间的电荷积累而损坏氧化物层。 Tie-Downs是对基板的反向偏置二极管,FET栅极,PFET孔,粘合焊盘和MIM电容顶部和底板需要。在正常操作条件下,这些二极管必须保持在反向偏置条件下。然而,大的双极信号可以在向前方向上偏压这些保护二极管,从而产生相当大的信号/功率损耗。本文介绍了一种小说方式,可以消除各个束缚二极管的需要,尤其是在输出节点处,其中可以存在双极信号,例如放大器电路。 EM仿真结果表明,该技术不会降低整体电路性能。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号