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RADIATION-INDUCED DEEP LEVELS IN LEAD AND TIN DOPED N-TYPE CZOCHRALSKI SILICON

机译:辐射诱导的铅和锡掺杂N型Czochralski硅中的深层水平

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This paper describes a Deep Level Transient Spectroscopy (DLTS) study of the electron traps that are created by high-energy electron or proton irradiations in n-type Czochralski silicon, doped with different Group IV elements. It is shown that while Sn is an efficient vacancy trap, leading to the formation of SnV centers, no specific Pb-related deep levels have been found in the upper half of the band gap. The dominant electron trap is the A center, while similar concentrations of SnV's are formed in Sn- and Pb+Sn-doped n-Cz material. A number of as yet unidentified deep levels has also been observed, together with some grown-in peaks, whereof some could be hydrogen-related. From a viewpoint of radiation hardening, these initial results demonstrate that Pb is little effective in suppressing the formation of radiation defects.
机译:本文介绍了由N型Czochralski硅中的高能量电子或质子辐射产生的电子疏水阀的深层瞬态光谱(DLTS)研究,掺杂有不同的IV元素。结果表明,虽然SN是一个有效的空位陷阱,导致SNV中心的形成,但在带隙的上半部没有发现特定的PB相关的深度水平。主导的电子捕集器是一个中心,而在Sn和Pb + Sn掺杂的N-CZ材料中形成类似浓度的SNV。还观察到许多尚未识别的深度水平,以及一些成长的峰,其中一些可能是氢气相关的。从辐射硬化的观点出发,这些初始结果表明PB在抑制辐射缺陷的形成时几乎没有有效。

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