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Analysis of Dislocation Structures in Bulk SiC Single Crystal by Synchrotron X-ray Topography

机译:同步X射线地形分析散装SiC单晶中的位错结构

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The detailed properties of the dislocations of SiC crystals were analyzed by means of transmission X-ray topography using ultrahigh-quality substrates manufactured by RAF (repeated a-face) growth method. From this analysis, we revealed the detailed features of one type of basal plane dislocations and two types of threading dislocations. The basal plane dislocations were screw type with Burgers vector were parallel to the 110 direction. One of the threading dislocations was mixed type close to screw dislocation parallel to the growth direction with Burgers vector of 1c+na (n=0, 1, 2, ). Another was the edge type parallel to the c-axis, which lay between two basal plane dislocations. Moreover, these dislocations were found to be connecting with each other, constituting large network structures.
机译:通过使用由RAF(重复A面)生长方法制造的超高质量基材的透射X射线形貌分析SiC晶体脱位的详细性质。根据该分析,我们揭示了一种类型的基础平面脱位和两种类型的螺纹脱位的详细特征。基底平面脱位是螺旋型,其中汉将向载体平行于110方向。其中一个穿线脱位被混合型接近螺旋位错平行于生长方向,汉将载体为1C + Na(n = 0,1,2,)。另一个是平行于C轴的边缘类型,其铺设在两个基础平面位错之间。此外,发现这些脱位彼此连接,构成大型网络结构。

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