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PHOTOLUMINESCENCE OF Fe-DOPED INP SINGLE CRYSTALS PRODUCED WITH VARIOUS WAFER PROCESSES

机译:用各种晶片工艺生产的Fe掺杂INP单晶的光致发光

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Semi-insulating Fe-doped InP single crystals are grown in this work using the vertical in-situ synthesis and single crystal growth method in a VGF furnace. The substrates, sliced from the head (close to the seed), middle and tail portions of the ingot, are subjected to the various wafer processes of slicing, solvent cleaning, lapping and polishing. Wafer characteristics are analyzed by photoluminescence (PL) sp ectroscopy and Hall m easurements. The PL features suggest that the resulting topograms are significantly influenced by the surface properties and crystal qualities of the Fe-InP wafer. A reference index of the epi-ready wafer could be selected from the superior PL topograms. The Fe doping concentration also influences the optical and electrical properties. Specifically; the wavelength of the PL is proportional to the Fe concentration, while the intensity reveals the opposite trend, and this might provide a calibration method to transform scanning PL topograms into a quantitative Fe distribution.
机译:在该工作中,使用垂直的原位合成和在VGF炉中的单晶生长方法生长半绝缘的Fe掺杂的单晶。从头部(靠近种子),中间和尾部的基板,经受切片,溶剂清洁,研磨和抛光的各种晶片过程。通过光致发光(PL)SP Extroscopy和Hall Meaurements分析晶片特性。 PL特征表明所得到的拓扑图受到Fe-InP晶片的表面性质和晶体质量的显着影响。可以从高级PL拓扑图中选择ePI就绪晶片的参考索引。 Fe掺杂浓度也影响光学和电气性质。具体来说; PL的波长与Fe浓度成比例,而强度揭示了相反的趋势,这可能提供校准方法,以将扫描PLOOPATAPS变为定量FE分布。

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