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Watermark strength determination based on a new contrast masking model

机译:基于新对比掩蔽模型的水印强度测定

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This paper presents a new approach in the selection of auspicious sites to be watermarked. The selection takes into account human visual system properties including luminance adaptation, contrast sensitivity and spatio-frequential selectivity. The paper exploits also the local band limited contrast to determine the maximum watermark strength to be applied without inducing visible degradations. Compared to the well known approaches, a contrast masking model is used here to adjust, site by site, the watermark strength. To test the approach efficiency, obtained results are considered in the context of an adaptive watermarking algorithm. The performance of this latter is evalauted in terms of watermark invisibility. Robustness to most common attacks such as JPEG compression, cropping (with zero padding) and low pass filtering is also considered.
机译:本文介绍了选择吉祥地点的新方法,以水印。该选择考虑了人类视觉系统特性,包括亮度适应,对比度灵敏度和时空选择性。本文还利用本地乐队限制性对比,以确定要施加的最大水印强度而不诱导可见的降解。与众所周知的方法相比,这里使用对比掩蔽模型来通过现场调整水印强度。为了测试方法效率,在自适应水印算法的背景下考虑获得的结果。本后者的性能在水印隐形方面是评估的。还考虑了诸如JPEG压缩,裁剪(带零填充)和低通滤波等大多数常见攻击的鲁棒性。

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