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Watermark strength determination based on a new contrast masking model

机译:基于新的对比度掩盖模型的水印强度确定

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摘要

This paper presents a new approach in the selection of auspicious sites to be watermarked. The selection takes into account human visual system properties including luminance adaptation, contrast sensitivity and spatio-frequential selectivity. The paper exploits also the local band limited contrast to determine the maximum watermark strength to be applied without inducing visible degradations. Compared to the well known approaches, a contrast masking model is used here to adjust, site by site, the watermark strength. To test the approach efficiency, obtained results are considered in the context of an adaptive watermarking algorithm. The performance of this latter is evaluated in terms of watermark invisibility. Robustness to most common attacks such as JPEG compression, cropping (with zero padding) and low pass filtering is also considered.
机译:本文提出了一种选择要加水印的吉祥地点的新方法。该选择考虑了人类视觉系统的属性,包括亮度适应,对比度灵敏度和时空选择性。本文还利用局部频带有限的对比度来确定要施加的最大水印强度,而不会引起可见的退化。与众所周知的方法相比,此处使用对比遮罩模型来逐位调整水印强度。为了测试进近效率,在自适应水印算法的背景下考虑了获得的结果。根据水印不可见性评估后者的性能。还考虑了对大多数常见攻击(例如JPEG压缩,裁剪(零填充)和低通滤波)的鲁棒性。

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